SPEAKERS
KEYNOTE
 
Paul Besser
Entegris
USA
Reinhold H. Dauskardt
Stanford University
USA
Shinichi Ogawa
AIST
Japan
 
INVITED MAM2025
 
Esther Adegoke
University of Limerick
Ireland
Cyril Colin-Madan
STMicroelectronics Crolles
France
Erika Covi
Groningen University
The Netherlands
Alberto Debernardi
IMM Agrate Brianza
Italy
Romain Duru
STMicroelectronics Crolles
France
Patrick Fiorenza
CNR-IMM
Italy
 
Inoue Fumihiro
Yokohama National University
Japan
Magali Grégoire
STMicroelectronics
France
Patrick Hopkins
University of Virginia
USA
Christopher Jezewski
Intel
USA
Guilhem Larrieu
LAAS-CNRS
France
Pawel Michalowski
Lukasiewicz Institute for Microelectronics and Photonics
Poland
 
Cristian Mocuta
SOLEIL synchrotron
France
Mikael Östling
KTH
Sweden
Stephan Roche
ICREA / ICN2
Spain
Philippe Rodriguez
CEA-Leti
France
Isabelle Servin
CEA-LETI
France
Kazuyoshi Ueno
Shibaura Institute of Technology
Japan
 
Bowen Zhang
Fraunhofer IKTS Dresden
Germany
 
KEYNOTE WORKSHOP
 
Anand Murthy
Lam
USA
 
INVITED WORKSHOP
 
Robert Clark
TEL
USA
Cara-Lena Nies
Tyndall National Institute
Ireland
Mikko Ritala
University of Helsinki
Finland
Henrik H. Sønsteby
University of Oslo
Norway
Chiyu Zhu
ASM
Finland
 
KEYNOTE
Paul Besser (Entegris, USA)  
Materials Innovations Driving AI Performance
Reinhold H. Dauskardt (Stanford University, USA)  
Next-Generation Processing of Functional Films for Advanced Optical and Electrical Performance
Shinichi Ogawa (AIST , Japan)  
Materials, Processes, and Characterization: Insights from the Past for Advancing Interconnect Development
INVITED MAM2025
Esther Adegoke (University of Limerick, Ireland)  
Defects in Action: Real-time TEM observation of Nickel Silicide Propagation in Silicon Nanowires
Cyril Colin-Madan (STMicroelectronics Crolles, France)  
Eco-Design in ST: a Sustainable journey
Erika Covi (Groningen University, The Netherlands)  
Back-end-of-line integration of emerging memory technologies for neuromorphic edge computing
Alberto Debernardi (IMM Agrate Brianza, Italy)  
Engineering electronic and optical properties of semiconductors by tuning the population of dopant defects: first principles simulations of Chalcogen hyperdoped Si
Romain Duru (STMicroelectronics Crolles, France)  
Photoluminescence Imaging : Shedding Light on the Invisible Defects in Silicon
Patrick Fiorenza (CNR-IMM, Italy)  
The role of interface chemistry and crystalline defects on the reliability of 4H-SiC MOSFETs
Inoue Fumihiro (Yokohama National University, Japan)  
Hybrid and Fusion Bonding to Enable Advanced Packaging
Magali Grégoire (STMicroelectronics, France)
3D-stacking technologies: remaining challenges of co-integration of thin Ni(Pt)Si film and TiSix contacts.
Patrick Hopkins (University of Virginia, USA)  
Measuring the thermal conductivity and scattering rates of metal and dielectric thin films
Christopher Jezewski (Intel, USA)  
Novel Patterning, Improved Epitaxial Quality, and Anisotropic Etest of Ion Beam Deposited In-Plane Ruthenium (0001) Nanowires for Low-Resistivity Interconnects
Guilhem Larrieu (LAAS-CNRS, France)  
Vertically Scaled Gate-All-Around Transistors: From Advanced Nano-Contact Engineering to Device Development
Pawel Michalowski (Lukasiewicz Institute for Microelectronics and Photonics, Poland)  
Secondary ion mass spectrometry measurements of non-planar materials and devices
Cristian Mocuta (SOLEIL synchrotron , France)  
Thin Films Characterization Using Fast Data Acquisition at DiffAbs Beamline
Mikael Östling (KTH, Sweden)
Wide Bandgap Device Technology for Power Efficient and High Temperature Applications
Stephan Roche (ICREA / ICN2, Spain)
Exploring properties and applications of amorphous 2D materials in interconnects using Artificial Intelligence
Philippe Rodriguez (CEA-Leti, France)  
Enabling III-V and CMOS Synergy: Advances in Contact Technology
Isabelle Servin (CEA-LETI, France)  
Assessment of environmental footprint of semiconductor manufacturing industry to promote more sustainable processes
Kazuyoshi Ueno (Shibaura Institute of Technology, Japan)
Graphene Capping for Advanced Interconnects
Bowen Zhang (Fraunhofer IKTS Dresden, Germany)  
Multi-scale correlative investigations of failure mechanisms on two-dimensional crystalline materials
INVITED WORKSHOP
Robert Clark (TEL, USA)
Selective and Self-Limited Process Technologies to Enable Ångstrom Scale Integrated Circuits
Cara-Lena Nies (Tyndall National Institute, Ireland)
Understanding and predicting interconnect metal deposition and morphology from atomic scale simulations
Mikko Ritala (University of Helsinki, Finland)  
ALD and AS-ALD of Metallic Films with New Precursors and Approaches
Henrik H. Sønsteby (University of Oslo, Norway)  
From stamp to wafer - How complex ALD processes become exponentially harder to control on fab-friendly scale
Chiyu Zhu (ASM, Finland)  
TBD
Sitemap  
© 2024 Phantoms Foundation