POSTERS

Information for poster presenters:

 
Poster size: A0 format (width: 841 mm x Height: 1189 mm) (Portrait / Vertical).
Posters Presentation: We recommend the poster presenters to stand in front of their poster in order to enhance fruitful discussions – designated time that the evaluators will pass by to discuss the work.
Posters Schedule: Posters Schedule: From Monday morning (March 24) to Thursday (March 27) just after the afternoon "Poster session"
Other info: To each poster will be assigned a number. You will find double side tape directly on the panel to hang your poster.
Check the number assigned to your poster at the entrance of the exhibition and posters hall.
** We would like to inform that abstracts won't be listed in the MAM2025 booklet if the registration fee is not paid until March 01, 2025.**
 
Posters (9) - Alphabetical order
Poster nº Author & Title Abstract
0 Bismiya fasni Chakkalakunnan (IM2NP, CNRS, Aix Marseille University, France)  
Kinetics of Phase Formation in Ni-Co-Si Ternary system using Bilayer and Alloyed thin films
0 Nicholas DALLA VEDOVA (STMicroelectronics, Italy)  
WCMP contact slurry influence on the formation of TaNTa barrier residues after metal 1 CuCMP
0 Filippo Formoso (STMicroelectronics.nv, Italy)  
AlCu crystallography modulation triggered by pre-deposition substrate treatment: implications for grain size and reflectivity.
0 FILLOT Frederic (Univ. Grenoble Alpes, CEA, Leti, France)  
Cross correlation of DSC / XRD on phase change thin film used in PCRAM technology
0 Ilaria Presotto (STMicroelectronics S.R.L., Italy)  
Influence of TaN/Ta Barrier Layer Thickness on Wafer Curvature and Via Chain Resistance
0 Valentina Robbiano (STMicroelectronics, Italy)  
Mechanisms of Edge Over Erosion Formation in Copper CMP
0 Karthick SEKAR (IM2NP, AMU, France)  
Impact of Ti interlayer on the formation of Co silicides.
0 Chihaya Suzuki (Shibaura Institute of Technology, Japan)  
Fabrication of RF device using Intercalated Multilayer Graphene / Nickel Layered Conductor
0 Yumehito Temmyo (Shibaura Institude of Technology, Japan)  
Investigation of Nano-Carbon Cap Formation on Ruthenium by Low Temperature Thermal CVD
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