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Posters (9) - Alphabetical order |
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Poster nº
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Author & Title
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Abstract
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Bismiya fasni Chakkalakunnan (IM2NP, CNRS, Aix Marseille University, France)
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Kinetics of Phase Formation in Ni-Co-Si Ternary system using Bilayer and Alloyed thin films
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Nicholas DALLA VEDOVA (STMicroelectronics, Italy)
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WCMP contact slurry influence on the formation of TaNTa barrier residues after metal 1 CuCMP
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Filippo Formoso (STMicroelectronics.nv, Italy)
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AlCu crystallography modulation triggered by pre-deposition substrate treatment: implications for grain size and reflectivity.
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FILLOT Frederic (Univ. Grenoble Alpes, CEA, Leti, France)
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Cross correlation of DSC / XRD on phase change thin film used in PCRAM technology
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Ilaria Presotto (STMicroelectronics S.R.L., Italy)
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Influence of TaN/Ta Barrier Layer Thickness on Wafer Curvature and Via Chain Resistance
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Valentina Robbiano (STMicroelectronics, Italy)
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Mechanisms of Edge Over Erosion Formation in Copper CMP
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Karthick SEKAR (IM2NP, AMU, France)
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Impact of Ti interlayer on the formation of Co silicides.
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Chihaya Suzuki (Shibaura Institute of Technology, Japan)
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Fabrication of RF device using Intercalated Multilayer Graphene / Nickel Layered Conductor
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Yumehito Temmyo (Shibaura Institude of Technology, Japan)
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Investigation of Nano-Carbon Cap Formation on Ruthenium by Low Temperature Thermal CVD
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0/9 |
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