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| ORALS (17) |
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Christoph Adelmann (imec, Belgium)
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Ru epitaxy on differently oriented sapphire substrates for advanced interconnect applications
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Ji Sang Ahn (Seoul National University of Science and Technology, South Korea)
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Inherent Area-Selective Deposition of Low-resistivity Molybdenum Carbide Films by Thermal Atomic Layer Deposition
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Andries Boelen (imec - KU Leuven, Belgium)
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Epitaxial SrTiO3 thin films on silicon for electro-optical quantum devices
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Theo Cabaret (CEA LETI, France)
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Nickel silicide phase change transformation upon nanosecond laser annealing
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Estève Drouillas (STMicroelectronics, France)
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Contribution of varying accelerating voltage for S/TEM EELS and EDS analysis of AlGaN/GaN based semiconductors
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Senne Fransen (imec, Belgium)
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Ultrahigh-density ‘electrolithic’ storage memory proof-of-principle with high-aspect-ratio nanometer-sized holes
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Stephane Lariviere (imec, Belgium)
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Electrical analysis of damascene patterned metal lines to evaluate patterning yield of EUV 0.33NA lithography
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Amanda Mallmann Tonelli (CEA, France)
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Optimizing ultrathin HfO2-ZrO2 structures by ALD for BEOL-compatible ferroelectric non-volatile memories
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Dominique Mangelinck (CNRS, Aix-Marseille Univ, IM2NP, France)
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A model for the redistribution of Pt during the agglomeration of Ni(Pt)Si thin films
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Simone Milazzo (University of Catania, Italy)
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Nearly-ideal Molybdenum Schottky contacts on AlGaN/GaN heterostructures
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Hamid Neggaz (IM2NP,Université Aix Marseille , France)
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Study ZnSb Phase Change Material Alloys for Nonvolatile Embedded-Memory Applications
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Bert Pollefliet (KU Leuven, Belgium)
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Crystallographic defects in orthorhombic ScSi / Si(001) contacts
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Clement Porret (imec, Belgium)
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Source/drain and silicides for nanosheet device applications
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Jean-Philippe Soulie (imec, Belgium)
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PtCoO2 delafossite oxide thin films for advanced interconnects
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Seppe Van Dyck (Ghent University, Belgium)
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Picking the Right TMD is the Key to Controlling Heat In a Phase Change Superlattice
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Yuki Yoshihara (Yokohama National University, Japan)
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Surface Analysis of SiO2 for Die-to-Wafer Hybrid Bonding
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Marco Zignale (CNR-IMM, Italy)
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Analytical evaluation of the interface states on SiO2/4H-SiC n-type MOS Capacitor
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| 17/17 |
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| 17/17 |
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