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Tue 19 |
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Wed 20 |
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Thu 21 |
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Chairperson: Magali Gregorie (STMicroelectronics, Italy) |
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08:30-08:50 |
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Investigation of superconductivity in ultrathin PtSi films formed by employing a novel self-alignment process |
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Yao Yao,
Uppsala University, Sweden |
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08:50-09:10 |
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Influence of annealing schemes on the formation and stability of Ni(Pt)Si thin films: partial, laser, total, and unique anneals |
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Fabriziofranco Morris,
STMicroelectronics, France |
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09:10-09:30 |
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Effect of Ni on the formation of Co silicides from Co-Ni alloy |
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Karthick Sekar,
IM2NP, Aix-Marseille Université, France |
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09:30-09:50 |
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ITO and NiOx/ITO off-axis PVD deposition for transparent contact application |
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Nicolas Coudurier,
CEA LETI, France |
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S11-Advanced Characterization & Metrology II |
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Chairperson: Christopher J. Wilson (Imec, Belgium) |
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10:10-10:40 |
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INVITED |
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Overview of Inline Metrology Challenges in IC manufacturing environment |
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Delphine Le Cunff,
STMicroelectronics, France |
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10:40-11:10 |
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INVITED |
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Strain and lattice tilt mapping of GaN on Si nanowires at early stage of coalescence by synchrotron x-ray nano diffraction |
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Patrice Gergaud,
CEA-LETI, France |
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11:10-11:30 |
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Innovative correlative study based on NBS and EDS analyses for nanoscale characterizations of cobalt silicide film |
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Karen Dabertand,
STMicroelectronics, France |
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11:30-11:50 |
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Usefulness of low voltage ion milling in the preparation of TEM lamellae in microelectronic industry |
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Jean-Gabriel Mattei,
STMicroelectronics, France |
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11:50-12:05 |
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Closing remarks |
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